Corning Introduces New Chemical Processing System for Research & Development Applications
Corning Incorporated today introduced the Corning® Low-Flow Reactor System 2 as the latest product line available in its Advanced-Flow™ Reactor (AFR) portfolio. The Low-Flow Reactor System 2 – featuring a Low-Flow Reactor 2, a Lab Dosing Unit, and a chiller, enables a plug-and-play system that offers flexibility and scalability to help customers develop and process chemicals in a more efficient manner.