Corning Announces Tropel® UltraFlat™ for EUV System

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Corning Announces Tropel® UltraFlat™ for EUV System

Corning Announces Tropel® UltraFlat™ for EUV System

Corning New UltraFlat™ for EUV System

News Releases
Advanced Optics
Corning Announces Tropel® UltraFlat™ for EUV System
Corning Announces Tropel® UltraFlat™ for EUV System
New photomask measurement system designed for the flatness requirements of extreme ultraviolet lithography

Corning Incorporated (NYSE: GLW) today announced it has commercialized the Tropel® UltraFlat™ for EUV system, a new photomask measurement system designed to help semiconductor manufacturers meet new flatness requirements for extreme ultraviolet (EUV) semiconductor lithography.

Starting in 2018, flatness specifications for EUV in the semiconductor industry are expected to be below 10 nanometers in variation. Until now, the current metrology infrastructure could not meet these tightened specifications.

The Tropel UltraFlat system for EUV is designed specifically to enable blank manufacturers and photomask shops to develop the processes required to achieve the stringent overlay requirements for EUV lithography, helping to deliver increased yields and manufacturing efficiencies.

"Based on our experience working closely with photomask and semiconductor manufacturers, we knew that flatness would become significantly more important for EUV,” said David Velasquez, commercial director, Corning Advanced Optics. “We've worked for over two years to understand the requirements and develop a solution that not only dramatically improves our measurement capabilities, but also collects the critical information photomask shops need to optimize their own development and operations efforts. By leveraging our core technologies in optical physics, Corning is able to introduce the UltraFlat for EUV system, which further extends our leadership into EUV lithography.”

Katherine Ballman, applications engineer, Corning Specialty Materials, will present a technical paper detailing Corning’s research in this area. The paper, titled “Error Analysis of Overlay Compensation Methodologies and Proposed Functional Tolerances for EUV Photomask Flatness,” will be presented on April 8, at Photomask Japan in Osaka.

Corning manufactures a complete line of non-contact optical metrology systems in its Fairport, New York, facility. These systems, designed to operate in a wide range of environments, quickly and accurately measure surfaces for flatness, parallelism, height, depth, surface finish or thickness. To learn more visit:

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About Corning Incorporated
Corning ( is one of the world’s leading innovators in materials science. For more than 160 years, Corning has applied its unparalleled expertise in specialty glass, ceramics, and optical physics to develop products that have created new industries and transformed people’s lives. Corning succeeds through sustained investment in R&D, a unique combination of material and process innovation, and close collaboration with customers to solve tough technology challenges. Corning’s businesses and markets are constantly evolving. Today, Corning’s products enable diverse industries such as consumer electronics, telecommunications, transportation, and life sciences. They include damage-resistant cover glass for smartphones and tablets; precision glass for advanced displays; optical fiber, wireless technologies, and connectivity solutions for high-speed communications networks; trusted products that accelerate drug discovery and manufacturing; and emissions-control products for cars, trucks, and off-road vehicles.